EUV Lithography

The TRUMPF laser system used in EUV lithography machines is one of the most impressive feats of precision I've come across. It must deliver a powerful pulse that is strong enough to vaporize tin droplets at a very precise interval. The sheer difficulty of stabilizing the laser requires almost every noise reduction and conditioning solution available. Managing that much power while keeping nanometer accuracy is an engineering challenge that requires a perfect balance of high-power physics, advanced optics, and real-time control.

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